Automated Mapping Systems

Fast, accurate, and reliable thin film thickness uniformity measurements

The FS-RT300 combines an FS-8 Multi-Wavelength Ellipsometer with a compact automated mapping stage to provide fast, accurate, and reliable film thickness uniformity measurements across a wafer.

Features and Specifications

  • 8 wavelengths of ellipsometric data (370, 450, 525, 595, 660, 735, 850, 950 nm), with long life LED sources, and no moving parts detector

  • Accurate thickness measurements for most transparent thin films from 0 – 5 μm

  • Typical time for wafer map: 2.5 minutes (49 points on a 300 mm diameter wafer)

  • Typical thickness repeatability: 0.002 nm

  • Integrated focusing probes, standard spot size:  0.8 x 1.9 mm (other spot sizes available)

  • Compact footprint: 400×500 mm, 22 kg

  • Stage travel: R (linear) 150 mm, resolution: 12 μm, Theta (rotation) 360°, resolution: 0.05°

  • USB camera option available

  • Motorized Z-stage for sample auto alignment

  • Contour and 3D plots of measured parameters

  • Flexible Scan Pattern Editor

Ellipsometry diagram - Thin film thickness



Thin Film Thickness Uniformity Measurement Examples

FS-1 Compact Footprint Ellipsometer - Thin film thickness

Example of 3-D Plot for Film Sense mapping systems for thin film thickness measurements 

Thin film thickness - FS-1 Compact Footprint Ellipsometer

Software screen for operating Film Sense mapping systems, and displaying the measurement results

Send Us Your Samples

As thin film applications are so varied and diverse, the best way to determine if a Film Sense Multi-Wavelength Ellipsometer is right for your application is to perform demonstration measurements on your actual samples. Please contact us to discuss your application, and arrange for sample measurements.


“We have purchased four Film Sense products for our small R&D group.  We have three FS-1 units and one FS-1EX unit with the RT300 mapping stage.  The Film Sense software is the most intuitive and easiest to use of all the ellipsometers I have experience using.  Our favorite feature is the multi-sample analysis method.   This feature allows you to determine the optical constants for new or poorly fitting films by simply measuring a small number of samples with various thicknesses.  Having knowledge of the actual thin film thickness values is not even necessary.  The software understands the optical constants must be the same for all samples, and each sample varies only in thin film thickness.  The user just needs to collect the data and press the fit button.  New films layers are created in just a couple of minutes.  We also love the automatic adjustment for sample height on the RT300 mapping stage.  Our process engineers are constantly adjusting the height on competitor’s units without this automatic feature.”

-Staff Systems Engineer at large semiconductor OEM

thin film thickness

“The system is great and we are having an increase of users using it. I am happy with the system and I direct users to use it when I am training them on our ALD deposition system. It gives great results and the customer support is quick and helpful too.”

– Tony Whipple, Scientist
Minnesota Nano Center

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